TrueNano, Inc. is an R&D company based in Westminster, CO, specializing in the development of semiconductor-based material and device technologies for efficient power converters, inverters, and variable frequency converters. Their focus lies in creating cost-effective silicon carbide epi-layers and wafers using their patented Hot Filament Chemical Vapor Deposition process (HFCVD), enabling lower growth temperatures while maintaining high growth rates.
With collaborations with the University of Colorado, Boulder, TrueNano, Inc. has presented papers at international conferences on the growth and analysis of defect-free 3C-SiC and 4H-SiC terraces. They have also been awarded Navy Phase I and II STTR grants for their work on growing Silicon Carbide on 6 and 8 inch substrates, further solidifying their position as a leading player in the field.
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